Sze, S. M.,  1936- <br/><br/>
Semiconductor devices, physics and technology / 
S.M. Sze. 
 - 2nd ed. 
 - New York :  Wiley,  c2002. 
 - viii, 564 p. :  ill. (some col.) ;  26 cm. 
<br/><br/>Includes bibliographical references and index. 
<br/><br/> Semiconductor Devices  Semiconductor Technology  Semiconductor Physics --  Energy Bands and Carrier Concentration in Thermal Equilibrium  Semiconductor Materials  Basic Crystal Structure  Basic Crystal Growth Technique  Valence Bonds  Energy Bands  Intrinsic Carrier Concentration  Donors and Acceptors  Carrier Transport Phenomena  Carrier Drift  Carrier Diffusion  Generation and Recombination Processes  Continuity Equation  Thermionic Emission Process  Tunneling Process  High-Field Effects  Semiconductor Devices --  p--n Junction  Basic Fabrication Steps  Thermal Equilibrium Condition  Depletion Region  Depletion Capacitance  Current-Voltage Characteristics  Charge Storage and Transient Behavior  Junction Breakdown  Heterojunction  Bipolar Transistor and Related Devices  Transistor Action  Static Characteristics of Bipolar Transistor  Frequency Response and Switching of Bipolar Transistor  Heterojunction Bipolar Transistor  Thyristor and Related Power Devices  MOSFET and Related Devices  MOS Diode  MOSFET Fundamentals  MOSFET Scaling  CMOS and BiCMOS  MOSFET on Insulator  MOS Memory Structures  Power MOSFET  MESFET and Related Devices  Metal-Semiconductor Contacts  MESFET  MODFET  Microwave Diodes, Quantum-Effect, and Hot-Electron Devices  Basic Microwave Technology  Tunnel Diode  IMPATT Diode  Transferred-Electron Devices  Quantum-Effect Devices  Hot-Electron Devices  Photonic Devices  Radiative Transitions and Optical Absorption  Light-Emitting Diodes  Semiconductor Laser  Photodetector  Solar Cell  Semiconductor Technology --  Crystal Growth and Epitaxy  Silicon Crystal Growth from the Melt  Silicon Float-Zone Process  GaAs Crystal-Growth Techniques  Material Characterization  Epitaxial-Growth Techniques  Structures and Defects in Epitaxial Layers  Film Formation  Thermal Oxidation  Dielectric Deposition  Polysilicon Deposition  Metallization  Lithography and Etching  Optical Lithography  Next-Generation Lithographic Methods  Wet Chemical Etching  Dry Etching  Microelectromechanical Systems  Impurity Doping  Basic Diffusion Process  Extrinsic Diffusion  Diffusion-Related Processes  Range of Implanted Ions  Implant Damage and Annealing  Implantation-Related Processes  Integrated Devices  Passive Components  Bipolar Technology  Mosfet Technology  Mesfet Technology  Challenges for Microelectronics  International Systems of Units (SI Units)  Unit Prefixes  Greek Alphabet  Physical Constants  Properties of Important Element and Binary Compound Semiconductors at 300 K  Properties of Si and GaAs at 300 K  Derivation of the Density of States in ar Semiconductor  Derivation of Recombination Rate for Indirect Recombination  Calculation of the Transmission Coefficient for a Symmetric Resonant-Tunneling Diode  Basic Kinetic Theory of Gases  1.1  1 --  1.2  7 --  Part I  Chapter 2  17 --  2.1  17 --  2.2  19 --  2.3  24 --  2.4  27 --  2.5  28 --  2.6  34 --  2.7  37 --  Chapter 3  47 --  3.1  48 --  3.2  57 --  3.3  60 --  3.4  66 --  3.5  72 --  3.6  73 --  3.7  75 --  Part II  Chapter 4  84 --  4.1  85 --  4.2  88 --  4.3  93 --  4.4  100 --  4.5  104 --  4.6  114 --  4.7  117 --  4.8  124 --  Chapter 5  130 --  5.1  131 --  5.2  137 --  5.3  146 --  5.4  151 --  5.5  156 --  Chapter 6  169 --  6.1  170 --  6.2  186 --  6.3  199 --  6.4  205 --  6.5  209 --  6.6  214 --  6.7  218 --  Chapter 7  224 --  7.1  225 --  7.2  237 --  7.3  247 --  Chapter 8  254 --  8.1  255 --  8.2  259 --  8.3  261 --  8.4  264 --  8.5  270 --  8.6  275 --  Chapter 9  282 --  9.1  282 --  9.2  288 --  9.3  298 --  9.4  311 --  9.5  318 --  Part III  Chapter 10  332 --  10.1  333 --  10.2  339 --  10.3  343 --  10.4  347 --  10.5  354 --  10.6  361 --  Chapter 11  369 --  11.1  370 --  11.2  378 --  11.3  388 --  11.4  390 --  Chapter 12  404 --  12.1  404 --  12.2  418 --  12.3  426 --  12.4  431 --  12.5  443 --  Chapter 13  452 --  13.1  453 --  13.2  462 --  13.3  466 --  13.4  469 --  13.5  477 --  13.6  481 --  Chapter 14  489 --  14.1  491 --  14.2  496 --  14.3  503 --  14.4  519 --  14.5  522 --  Appendix B  533 --  Appendix C  534 --  Appendix D  535 --  Appendix E  536 --  Appendix F  537 --  Appendix G  538 --  Appendix H  539 --  Appendix I  541 --  Appendix J  543 --  Appendix K  545. 
<br/><br/><label>ISBN: </label>0471333727 (cloth : alk. paper) 9780471333722 (cloth : alk. paper) 
<br/><br/><label>LCCN: </label>2001026003 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Semiconductors.
<br/><br/><label>LC Class. No.: </label>TK7871.85  / .S9883 2002 
<br/><br/><label>Dewey Class. No.: </label>621.3815/2